TY - GEN
T1 - TEM characterization of near sub-grain boundary dislocations in directionally solidified multicrystalline silicon
AU - Kivambe, Maulid
AU - Stokkan, Gaute
AU - Ervik, Torunn
AU - Ryningen, Birgit
AU - Lohne, Otto
PY - 2011
Y1 - 2011
N2 - A crystal is known to achieve lower energy if lattice dislocations are re-arranged in arrays forming a sub-grain boundary through a recovery process. Interaction of boundary dislocations with glide dislocations is also expected to bring about local equilibrium. In this work, dislocations localized in the vicinity of a sub-grain boundary (misorientation < 5° ) are studied in detail by transmission electron microscopy in order to determine their source. Contrary to the processes described above, it appears that the sub-grain boundary is the source of these dislocations, which are emitted from some locally stressed parts of the boundary. Several slip systems have been activated along the boundary resulting in high density of dislocations. It appears, further, that dislocation propagation from one or more sources is disrupted by interaction with other dislocations or other defects. The dislocations from various sources will be piled up against the obstacles of the other, resulting in the localization of the dislocations close to the sub-grain boundary.
AB - A crystal is known to achieve lower energy if lattice dislocations are re-arranged in arrays forming a sub-grain boundary through a recovery process. Interaction of boundary dislocations with glide dislocations is also expected to bring about local equilibrium. In this work, dislocations localized in the vicinity of a sub-grain boundary (misorientation < 5° ) are studied in detail by transmission electron microscopy in order to determine their source. Contrary to the processes described above, it appears that the sub-grain boundary is the source of these dislocations, which are emitted from some locally stressed parts of the boundary. Several slip systems have been activated along the boundary resulting in high density of dislocations. It appears, further, that dislocation propagation from one or more sources is disrupted by interaction with other dislocations or other defects. The dislocations from various sources will be piled up against the obstacles of the other, resulting in the localization of the dislocations close to the sub-grain boundary.
KW - Dislocations
KW - Mc-si
KW - Sub grain boundaries
KW - TEM
UR - https://www.scopus.com/pages/publications/80053242883
U2 - 10.4028/www.scientific.net/SSP.178-179.307
DO - 10.4028/www.scientific.net/SSP.178-179.307
M3 - Conference contribution
AN - SCOPUS:80053242883
SN - 9783037852323
T3 - Solid State Phenomena
SP - 307
EP - 312
BT - Gettering and Defect Engineering in Semiconductor Technology XIV, GADEST2011
PB - Trans Tech Publications Ltd
T2 - 14th International Biannual Meeting on Gettering and Defect Engineering in Semiconductor Technology, GADEST2011
Y2 - 25 September 2011 through 30 September 2011
ER -