Abstract
Direct metal nano patterning is provided by constructing a carbon-based sheet that include self-assembled molecular monolayers (SAMs) of metals; and applying an electron beam to the carbon-based sheet to impart a pattern of metallic nano-particles in the carbon-based sheet.
| Original language | English |
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| Patent number | US2024014004 |
| IPC | H01J 37/ 317 A I |
| Priority date | 11/07/23 |
| Publication status | Published - 11 Jan 2024 |