Abstract
In this paper, we report the evolution of silicon heterojunction solar cell properties focusing, in particular, on the indium tin oxide (ITO) layers upon consecutive thermal annealing. We find that the charge carrier density Ne of the ITO increases with higher thermal budget, while the carrier mobility remains constant. For the solar cells, their series resistance at the maximum power point RMPPS first decreases due to the reduction of the ITO's sheet resistance. With further annealing, RMPPS increases again. As all monitored RS components decrease, we attribute this to an increase of the contact resistance. The implied VOC and the implied fill factor both slightly degrade for annealing temperatures above 190 °C for our layers. This, as well as the change in Ne of the ITO, must be carefully considered when optimizing the thermal budget needed, e.g., for sputter damage or screen-printing paste curing.
| Original language | English |
|---|---|
| Article number | 8771183 |
| Pages (from-to) | 1202-1207 |
| Number of pages | 6 |
| Journal | IEEE Journal of Photovoltaics |
| Volume | 9 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - Sept 2019 |
Keywords
- Indium tin oxide (ITO)
- loss analysis
- refractive index
- selectivity
- series resistance
- silicon heterojunction (SHJ)
- sputter damage
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